Fabrication of Graphene Oxide Thin Films on Transparent Substrate via a Low-Voltage Electrodeposion Technique
نویسندگان
چکیده مقاله:
Graphene oxide (GO) thin films were simply deposited on fluorine doped tin oxide (FTO) substrate via a low-voltage electrodeposition. The GO and GO thin films were characterized by Zeta Potential, X-ray diffraction, Ultraviolet-Visible spectroscopy, atomic force microscopy, Fourier transform infrared spectroscopy, field emission scanning electron microscopy and energy dispersive X-ray spectroscopy. The results confirm existence of multi-layered graphene oxide. UV-vis spectra exhibit GO thin films possess 60-80% transmittance in the visible region. Calculating calculating optical band gap from UV-vis spectra either for GO solution and GO thin film suggests a simultaneous reduction occurred during deposition.
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عنوان ژورنال
دوره 1 شماره 2
صفحات 6- 10
تاریخ انتشار 2015-06-01
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